DocumentCode
1105829
Title
Minimizing floating-body-induced threshold voltage variation in partially depleted SOI CMOS
Author
Wei, Andy ; Antoniadis, Dimitri A. ; Bair, Lawrence A.
Author_Institution
Microsystems Technol. Labs., MIT, Cambridge, MA, USA
Volume
17
Issue
8
fYear
1996
Firstpage
391
Lastpage
394
Abstract
Pulse propagation problems associated with dynamic floating-body effects, e.g., pulse stretching, is measured in partially depleted SOI CMOS inverter chains. Pulse stretching is found to be dependent on pulse frequency and V/sub DD/. Such behavior is attributed to floating-body-induced transient threshold voltage variation in partially depleted SOI CMOS devices due to floating-body charge imbalance between logic states during CMOS switching. Such an imbalance can be minimized through proper device design because of the different dependencies of the gate and drain depletion charges on channel length, silicon film thickness, gate oxide thickness, channel doping, and supply voltage. This is confirmed by measuring the maximum transient threshold voltage variation in discrete partially depleted SOI NMOS devices in configurations which are predictive of CMOS switching behavior.
Keywords
CMOS logic circuits; logic gates; silicon-on-insulator; CMOS inverter chains; CMOS switching behaviour; NMOS devices; Si; Si film thickness; channel doping; channel length; drain depletion charges; dynamic floating-body effects; floating-body-induced threshold voltage variation; gate depletion charges; gate oxide thickness; logic states; partially depleted SOI CMOS; pulse frequency; pulse propagation problems; pulse stretching; supply voltage; transient threshold voltage variation; CMOS logic circuits; Doping; Frequency; Logic devices; MOS devices; Pulse inverters; Pulse measurements; Semiconductor films; Silicon; Threshold voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.511585
Filename
511585
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