DocumentCode
1106903
Title
Scaling Limits of Double-Gate and Surround-Gate Z-RAM Cells
Author
Butt, Nauman Z. ; Alam, Muhammad Ashraful
Author_Institution
Purdue Univ., West Lafayette
Volume
54
Issue
9
fYear
2007
Firstpage
2255
Lastpage
2262
Abstract
We consider the scaling of the capacitorless single-transistor [zero-capacitor RAM (Z-RAM)] dynamic RAM (DRAM) cells having surround-gate and double-gate structures. We find that the scaling is limited to the channel length of approximately 25 nm for both types of cells, which is somewhat more pessimistic than previously believed. The mechanisms that are found to be of most importance in imposing the scaling limits are as follows: 1) short-channel effects; 2) quantum confinement of carriers in the body; and 3) band-to-band tunneling at the source/drain-to-body junctions. Like other DRAM cells, practical considerations such as the process variations in cell dimensions, random doping fluctuations, and single-event upsets are likely to remain as important scaling concerns for Z-RAM cells.
Keywords
random-access storage; band-to-band tunneling; double-gate Z-RAM cells; double-gate structures; dynamic RAM cells; quantum confinement; scaling limits; short-channel effects; single-transistor; source/drain-to-body junctions; surround-gate Z-RAM cells; surround-gate structures; zero-capacitor RAM; Capacitance; Capacitors; DRAM chips; Doping; Fluctuations; Logic; Potential well; Random access memory; Tunneling; Voltage; Capacitorless; double gate; quantum confinement; scaling; simulation; surround gate;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2007.902691
Filename
4294187
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