• DocumentCode
    1106903
  • Title

    Scaling Limits of Double-Gate and Surround-Gate Z-RAM Cells

  • Author

    Butt, Nauman Z. ; Alam, Muhammad Ashraful

  • Author_Institution
    Purdue Univ., West Lafayette
  • Volume
    54
  • Issue
    9
  • fYear
    2007
  • Firstpage
    2255
  • Lastpage
    2262
  • Abstract
    We consider the scaling of the capacitorless single-transistor [zero-capacitor RAM (Z-RAM)] dynamic RAM (DRAM) cells having surround-gate and double-gate structures. We find that the scaling is limited to the channel length of approximately 25 nm for both types of cells, which is somewhat more pessimistic than previously believed. The mechanisms that are found to be of most importance in imposing the scaling limits are as follows: 1) short-channel effects; 2) quantum confinement of carriers in the body; and 3) band-to-band tunneling at the source/drain-to-body junctions. Like other DRAM cells, practical considerations such as the process variations in cell dimensions, random doping fluctuations, and single-event upsets are likely to remain as important scaling concerns for Z-RAM cells.
  • Keywords
    random-access storage; band-to-band tunneling; double-gate Z-RAM cells; double-gate structures; dynamic RAM cells; quantum confinement; scaling limits; short-channel effects; single-transistor; source/drain-to-body junctions; surround-gate Z-RAM cells; surround-gate structures; zero-capacitor RAM; Capacitance; Capacitors; DRAM chips; Doping; Fluctuations; Logic; Potential well; Random access memory; Tunneling; Voltage; Capacitorless; double gate; quantum confinement; scaling; simulation; surround gate;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2007.902691
  • Filename
    4294187