DocumentCode
1107674
Title
Electron and hole impact ionization rates in InP/Ga0.47 In0.53 As superlattice
Author
Osaka, Fukunobu ; Mikawa, Takashi ; Wada, Osamu
Author_Institution
Fujitsu Labs. Ltd., Atsugi, Japan
Volume
22
Issue
10
fYear
1986
fDate
10/1/1986 12:00:00 AM
Firstpage
1986
Lastpage
1991
Abstract
The electron and hole impact ionization rates, α andβ, in an InP/Ga0.47 In0.53 As superlattice have been experimentally determined from photomultiplication data made on an InP/GaInAs superlattice photodiode. A Monte Carlo simulation of α and β in the superlattice has been developed, and the enhancement of impact ionization due to the effect of the band edge discontinuity has been investigated. The experimental ionization rates have been analyzed by the simulation. The larger β than α in the superlattice has been shown to be explained by the valence band discontinuity about two times larger than the conduction band edge discontinuity in this superlattice structure.
Keywords
Avalanche photodiodes; Superlattices; Absorption; Charge carrier processes; Gain measurement; Impact ionization; Indium phosphide; Lattices; Optical buffering; Optical superlattices; Photodiodes; Substrates;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1986.1072885
Filename
1072885
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