• DocumentCode
    1107674
  • Title

    Electron and hole impact ionization rates in InP/Ga0.47In0.53As superlattice

  • Author

    Osaka, Fukunobu ; Mikawa, Takashi ; Wada, Osamu

  • Author_Institution
    Fujitsu Labs. Ltd., Atsugi, Japan
  • Volume
    22
  • Issue
    10
  • fYear
    1986
  • fDate
    10/1/1986 12:00:00 AM
  • Firstpage
    1986
  • Lastpage
    1991
  • Abstract
    The electron and hole impact ionization rates, α andβ, in an InP/Ga0.47In0.53As superlattice have been experimentally determined from photomultiplication data made on an InP/GaInAs superlattice photodiode. A Monte Carlo simulation of α and β in the superlattice has been developed, and the enhancement of impact ionization due to the effect of the band edge discontinuity has been investigated. The experimental ionization rates have been analyzed by the simulation. The larger β than α in the superlattice has been shown to be explained by the valence band discontinuity about two times larger than the conduction band edge discontinuity in this superlattice structure.
  • Keywords
    Avalanche photodiodes; Superlattices; Absorption; Charge carrier processes; Gain measurement; Impact ionization; Indium phosphide; Lattices; Optical buffering; Optical superlattices; Photodiodes; Substrates;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.1986.1072885
  • Filename
    1072885