• DocumentCode
    1109493
  • Title

    Modeling and analysis of transient latchup in double-well bulk CMOS

  • Author

    Goto, Gensuke ; Takahashi, Hiromasa ; Nakamura, Tetsuo

  • Author_Institution
    Fujitsu Laboratories, Atsugi, Japan
  • Volume
    33
  • Issue
    9
  • fYear
    1986
  • fDate
    9/1/1986 12:00:00 AM
  • Firstpage
    1341
  • Lastpage
    1347
  • Abstract
    Characteristics of transient latchup due to noise excitation through the gate of a parasitic SCR are measured and described by a new simplified model to clarify latchup immunity in a double-well CMOS with a nonepitaxial substrate. The model accounts for the effects of high-level carrier injection and base transit delays of the two parasitic transistors, and it can describe the observed latchup transient faithfully if the model parameters are given according to the predetermined procedure. The noise-pulse-width dependence of the latchup trigger current is obtained as a function of current gain, transit time, and transistor base-emitter shunt resistance to show the last one most sensitive to the trigger current. The optimum parameters with the double well are deduced from study to relate the model to structural parameters.
  • Keywords
    Circuit noise; MOSFET circuits; Power dissipation; Power supplies; Semiconductor device modeling; Semiconductor device noise; Semiconductor process modeling; Substrates; Thyristors; Transient analysis;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22668
  • Filename
    1485885