DocumentCode
111551
Title
Threshold Voltage and DIBL Variability Modeling Based on Forward and Reverse Measurements for SRAM and Analog MOSFETs
Author
Damrongplasit, Nattapol ; Zamudio, Luis ; Tsu-Jae King Liu ; Balasubramanian, Sriram
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Univ. of California at Berkeley, Berkeley, CA, USA
Volume
62
Issue
4
fYear
2015
fDate
Apr-15
Firstpage
1119
Lastpage
1126
Abstract
A physically based variability model is developed to explain threshold voltage (
) and drain-induced barrier lowering (DIBL) variations, and their correlations for static RAMs (SRAMs) and analog devices fabricated in a 32-nm high-
metal-gate technology. Inputs to the model rely on forward (F) and reverse (R) measurement of transistor pair mismatch. The modeling results are validated on SRAMs and analog devices. Asymmetric and symmetric variation components of
and DIBL variability are extracted by the model. Asymmetric variation is a major component responsible for the higher
mismatch in saturation region compared with linear region, and higher DIBL variability.
Keywords
MOSFET; SRAM chips; high-k dielectric thin films; integrated circuit modelling; semiconductor device models; DIBL variability; DIBL variability modeling; SRAM; analog MOSFET; analog devices; asymmetric variation component; drain-induced barrier lowering variation; forward-reverse measurements; high-K metal-gate technology; linear region; physically-based variability model; saturation region; static RAM; symmetric variation component; threshold voltage; transistor pair mismatch; Correlation; Electric potential; Mathematical model; Random access memory; Standards; Threshold voltage; Transistors; Asymmetric; asymmetric halo; drain-induced barrier lowering (DIBL); forward; mismatch; random dopant fluctuation (RDF); reverse; static RAM (SRAM); threshold voltage; variability;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2015.2408215
Filename
7064860
Link To Document