• DocumentCode
    1116029
  • Title

    C2F6reactive ion-beam etching of LiNbO3and Nb2O5and their application to optical waveguides

  • Author

    Zhang, Bei ; Forouhar, Siamak ; Huang, S.Y. ; Chang, William S C

  • Author_Institution
    University of California, San Diego, La Jolla, CA, USA
  • Volume
    2
  • Issue
    4
  • fYear
    1984
  • fDate
    8/1/1984 12:00:00 AM
  • Firstpage
    528
  • Lastpage
    530
  • Abstract
    Properties of C2F6(freon 116) reactive ion-beam etching (RIBE) of LiNbO3, Ti-indiffused LiNbO3, and sputter-deposited Nb2O5film on LiNbO3are reported. A maximum differential etching ratio of approximately 5:1 has been measured for LiNbO3and the AZ 1350B Shipley photoresist. We have used this etching technique to fabricate diffraction gratings on both Ti-indiffused LiNbO3and Nb2O5- LiNbO3waveguides with measured throughput efficiencies in excess of 85 percent.
  • Keywords
    Optical planar waveguides; Planar optical waveguide; Chemical processes; Control systems; Dry etching; Ion beams; Optical films; Optical waveguides; Resists; Sputter etching; Weight control; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.1984.1073644
  • Filename
    1073644
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1116029