DocumentCode
1119365
Title
Micromanipulator vision for wafer probing
Author
Dantu, R.V. ; Dimopoulos, N.J. ; Patel, R.V. ; Al-Khalili, A.J.
Author_Institution
Dept. of Electr. & Comput. Eng., Concordia Univ., Montreal, Que., Canada
Volume
2
Issue
3
fYear
1989
fDate
8/1/1989 12:00:00 AM
Firstpage
114
Lastpage
117
Abstract
An overview is presented of a micromanipulator vision system for use in automating various functions during the testing of a wafer for semiconductor parameters and inspection of VLSI circuits. It is assumed that the wafer under test is not necessarily in its proper orientation. It is required that certain probes be lowered automatically onto certain pads to inject test vectors and to read the results for analysis. A methodology was developed for determining the position (especially the vertical distance from the target) of the tip of a probe, so that it can be guided accurately to its target pad. Standard image processing steps used for efficient feature extraction and registration of the target integrated circuit are outlined, and a method of obtaining the vertical distance of the tip of a probe from its target pad is presented. Two different criteria through which it can be established whether a probe is in contact with its target are given. The algorithm developed was tested for touch using different types of tips such as tungsten and tungsten carbide, and with NMOS and CMOS processes. Clean and accurate representations of the probes were extracted from integrated images in all the tests, and in all cases, touch was achieved without the surface being scratched
Keywords
VLSI; computer vision; computerised picture processing; inspection; CMOS processes; NMOS ICs; W tip; WC tip; automating various functions; efficient feature extraction; image processing steps; inspection of VLSI circuits; micromanipulator vision system; overview; registration; vertical distance; wafer probing; Automatic testing; Circuit testing; Inspection; Machine vision; Micromanipulators; Probes; Semiconductor device testing; System testing; Tungsten; Very large scale integration;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.29680
Filename
29680
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