DocumentCode
1119425
Title
Effect of RuO2 on the behavior of silver at thick-film terminations
Author
Yamaguchi, Takashi ; Kageyama, Makiko
Author_Institution
Fac. of Sci. & Technol., Keio Univ., Yokohama, Japan
Volume
11
Issue
1
fYear
1988
fDate
3/1/1988 12:00:00 AM
Firstpage
134
Lastpage
136
Abstract
In an attempt to understand the silver-glass interactions at the electrode/resistor terminations in hybrid integrated circuits, the behavior of silver in binary 75PbO-25SiO2 glass containing up to 20 wt.% RuO2 particles was studied between 650 and 850°. It is shown that the dissolution of silver into glass increases with increasing amount of RuO2 particles. A different temperature dependence of dissolution was observed for RuO2-free and RuO2-doped glasses. Silver-ion-RuO 2 interactions have been proposed as a possible mechanism responsible for the increased dissolution of silver in the glass
Keywords
glass; ruthenium compounds; silver; thick film resistors; 650 to 850 C; Ag-RuO2 interactions; PbO-SiO2 glass; PbO-SiO2-RuO2 glass; electrode resistor terminations; hybrid integrated circuits; temperature dependence of dissolution; thick-film terminations; Conductivity; Electrodes; Glass; Hybrid integrated circuits; Nonlinear optics; Powders; Resistors; Silver; Temperature dependence; Wire;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/33.2976
Filename
2976
Link To Document