• DocumentCode
    1119425
  • Title

    Effect of RuO2 on the behavior of silver at thick-film terminations

  • Author

    Yamaguchi, Takashi ; Kageyama, Makiko

  • Author_Institution
    Fac. of Sci. & Technol., Keio Univ., Yokohama, Japan
  • Volume
    11
  • Issue
    1
  • fYear
    1988
  • fDate
    3/1/1988 12:00:00 AM
  • Firstpage
    134
  • Lastpage
    136
  • Abstract
    In an attempt to understand the silver-glass interactions at the electrode/resistor terminations in hybrid integrated circuits, the behavior of silver in binary 75PbO-25SiO2 glass containing up to 20 wt.% RuO2 particles was studied between 650 and 850°. It is shown that the dissolution of silver into glass increases with increasing amount of RuO2 particles. A different temperature dependence of dissolution was observed for RuO2-free and RuO2-doped glasses. Silver-ion-RuO 2 interactions have been proposed as a possible mechanism responsible for the increased dissolution of silver in the glass
  • Keywords
    glass; ruthenium compounds; silver; thick film resistors; 650 to 850 C; Ag-RuO2 interactions; PbO-SiO2 glass; PbO-SiO2-RuO2 glass; electrode resistor terminations; hybrid integrated circuits; temperature dependence of dissolution; thick-film terminations; Conductivity; Electrodes; Glass; Hybrid integrated circuits; Nonlinear optics; Powders; Resistors; Silver; Temperature dependence; Wire;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/33.2976
  • Filename
    2976