• DocumentCode
    1121226
  • Title

    Ga0.4In0.6As/Al0.55In0.45As pseudomorphic modulation-doped field-effect transistors

  • Author

    Kuo, J.M. ; Chang, Tao-yuan ; Lalevic, B.

  • Author_Institution
    AT&T Bell Laboratories, Holmdel, NJ
  • Volume
    8
  • Issue
    9
  • fYear
    1987
  • fDate
    9/1/1987 12:00:00 AM
  • Firstpage
    380
  • Lastpage
    382
  • Abstract
    High-performance pseudomorphic Ga0.4In0.6As/ Al0.55In0.45As modulation-doped field-effect transistors (MODFET´s) grown by MBE on InP have been fabricated and characterized. DC transconductances as high as 271, 227, and 197 mS/mm were obtained at 300K for 1.6-µm and 2.9-µm gate-length enhancement-mode and 2-µm depletion-mode devices, respectively. An average electron velocity as high as 2.36 × 107cm/s has been inferred for the 1.6-µm devices, which is higher than previously reported values for 1-µm gate-length Ga0.47In0.53As/Al0.48In0.52As MODFET´s. The higher bandgap Al0.55In0.45As pseudomorphic barrier also offers the advantages of a larger conduction-band discontinuity and a higher Schottky barrier height.
  • Keywords
    Electron mobility; Epitaxial layers; FETs; Gallium arsenide; HEMTs; Indium phosphide; MODFETs; Photonic band gap; Schottky barriers; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1987.26667
  • Filename
    1487217