DocumentCode
1121226
Title
Ga0.4 In0.6 As/Al0.55 In0.45 As pseudomorphic modulation-doped field-effect transistors
Author
Kuo, J.M. ; Chang, Tao-yuan ; Lalevic, B.
Author_Institution
AT&T Bell Laboratories, Holmdel, NJ
Volume
8
Issue
9
fYear
1987
fDate
9/1/1987 12:00:00 AM
Firstpage
380
Lastpage
382
Abstract
High-performance pseudomorphic Ga0.4 In0.6 As/ Al0.55 In0.45 As modulation-doped field-effect transistors (MODFET´s) grown by MBE on InP have been fabricated and characterized. DC transconductances as high as 271, 227, and 197 mS/mm were obtained at 300K for 1.6-µm and 2.9-µm gate-length enhancement-mode and 2-µm depletion-mode devices, respectively. An average electron velocity as high as 2.36 × 107cm/s has been inferred for the 1.6-µm devices, which is higher than previously reported values for 1-µm gate-length Ga0.47 In0.53 As/Al0.48 In0.52 As MODFET´s. The higher bandgap Al0.55 In0.45 As pseudomorphic barrier also offers the advantages of a larger conduction-band discontinuity and a higher Schottky barrier height.
Keywords
Electron mobility; Epitaxial layers; FETs; Gallium arsenide; HEMTs; Indium phosphide; MODFETs; Photonic band gap; Schottky barriers; Transconductance;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1987.26667
Filename
1487217
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