DocumentCode
113352
Title
Preparation and characterization of Cu2 ZnGeS4 thin films by sulfurizing reactively sputtered precursors
Author
Jian Chen ; Lianbo Zhao ; Fangyang Liu ; Shujuan Huang ; Xiaojing Hao
Author_Institution
Australian Centre for Adv. Photovoltaics, Univ. of New South Wales, Sydney, NSW, Australia
fYear
2014
fDate
14-17 Dec. 2014
Firstpage
254
Lastpage
257
Abstract
Cu2ZnGeS4 (CZGS) thin films were first grown by reactive magnetron co-sputtering technique and post sulfurization. Raman and X-ray diffraction (XRD) examination confirm the synthesized films to be tetragonal stannite CZGS together with ZnS secondary phase. The effect of two manufacturing conditions was investigated: sputtering pressure for precursor deposition and sulfurization temperature. By decreasing the sputtering pressure, the CZGS grain size in the sulfurized films is found to be increased. By increasing the sulfurization temperature, the CZGS grain size is also increased. However, serious voids and pinholes are found in the sample undergoing high sulfurization temperature. The formation of voids and pinholes can be explained by Ge loss via Ge sulfides sublimation. Besides, the M0S2 layer thickness is found dramatically increased after high-temperature sulfurization process.
Keywords
Raman spectra; X-ray diffraction; copper compounds; germanium compounds; grain size; high-temperature effects; semiconductor growth; semiconductor thin films; sputter deposition; voids (solid); zinc compounds; Cu2ZnGeS4; Ge sulfide sublimation; MoS2 layer thickness; Raman spectra; X-ray diffraction; XRD; ZnS secondary phase; grain size; manufacturing condition; pinhole formation; precursor deposition; reactive magnetron cosputtering technique; sputtering pressure; sulfurization temperature; sulfurizing reactively sputtered precursor; tetragonal stannite CZGS materials; thin film preparation; void formation; Chemicals; Educational institutions; Films; Grain size; Photovoltaic cells; Sputtering; X-ray scattering; Cu2 ZnGeS4 ; reactive sputtering; sputtering pressure; sulfurization temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2014 Conference on
Conference_Location
Perth, WA
Print_ISBN
978-1-4799-6867-1
Type
conf
DOI
10.1109/COMMAD.2014.7038705
Filename
7038705
Link To Document