• DocumentCode
    1142478
  • Title

    Line Edge Detection and Characterization in SEM Images Using Wavelets

  • Author

    Sun, Wei ; Romagnoli, Jose A. ; Tringe, Joseph W. ; Létant, Sonia E. ; Stroeve, Pieter ; Palazoglu, Ahmet

  • Author_Institution
    Beijing Univ. of Chem. Technol., Beijing
  • Volume
    22
  • Issue
    1
  • fYear
    2009
  • Firstpage
    180
  • Lastpage
    187
  • Abstract
    Edge characterization has become increasingly important in nanotechnology due to the growing demand for precise nanoscale structure fabrication and assembly. Edge detection and assembly. Edge detection is often performed by thresholding the spatial information of a top-down image obtained by scanning electron microscopy or other surface characterization techniques. Results are highly dependent on an arbitrary threshold value, which makes it difficult to reveal the nature of the real surface and to compare results among images. In this paper, we present an alternative edge boundary detection technique based on the wavelet framework. Our results indicate that the method facilitates nanoscale edge detection and characterization by providing a systematic threshold determination step.
  • Keywords
    edge detection; image segmentation; nanofabrication; photoresists; scanning electron microscopy; semiconductor device measurement; surface roughness; surface topography measurement; wavelet transforms; SEM images; line edge boundary detection technique; nanoscale structure assembly; nanoscale structure fabrication; nanotechnology; photoresist process; roughness characterization; scanning electron microscopy; spatial information; wavelet-based method; Atomic force microscopy; Chemical engineering; Fabrication; Image edge detection; Laboratories; Rough surfaces; Scanning electron microscopy; Sun; Surface roughness; Surface topography; Line edge roughness (LER); scanning electron microscopy (SEM); wavelets;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2008.2011174
  • Filename
    4773474