DocumentCode
1142895
Title
Lateral n-p-n avalanche photodiode with an AlInAs multiplication layer
Author
Yagyu, E. ; Ishimura, E. ; Tomita, N. ; Nakaji, M. ; Aoyagi, T. ; Yoshiara, K. ; Tokuda, Y.
Author_Institution
Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Amagasaki
Volume
44
Issue
9
fYear
2008
Firstpage
591
Lastpage
592
Abstract
A quasi-planar AllnAs avalanche photodiode (APD) with a lateral n-p-n structure for optical fibre communications is reported. Although both the anode and the cathode contact the n-type regions, it is demonstrated that the n-p-n APD has the same performance as a normal p-n APD. The n-p-n structure enables the p-type conversion process of thermal Zn diffusion to be omitted, and AlInAs with a large gain bandwidth product and low noise to be utilised for a multiplication region. The n-p-n AlInAs APDs can provide better receiver sensitivity at 10 Gbit/s than commercially available InP APDs.
Keywords
III-V semiconductors; aluminium compounds; avalanche photodiodes; indium compounds; optical fibre communication; optical receivers; thermal diffusion; zinc; AlInAs; bit rate 10 Gbit/s; lateral n-p-n avalanche photodiode; multiplication layer; n-p-n structure; optical fibre communications; p-type conversion process; receiver sensitivity; thermal zinc diffusion;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20080456
Filename
4497346
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