• DocumentCode
    1146312
  • Title

    Electron velocity saturation in heterostructure field-effect transistors

  • Author

    Han, Chien-Jin ; Ruden, P.Paul ; Nohava, Thomas E. ; Narum, David H. ; Grider, David E. ; Newstrom, K. ; Joslyn, P. ; Shur, Michael S.

  • Author_Institution
    Honeywell Sensors & Signal Process. Lab., Bloomington, MN, USA
  • Volume
    37
  • Issue
    3
  • fYear
    1990
  • fDate
    3/1/1990 12:00:00 AM
  • Firstpage
    530
  • Lastpage
    535
  • Abstract
    Results on gate-length scaling of the performance of enhancement-mode heterostructure field-effect transistors (HFETs) for gate lengths of between 0.4 and 10 μm are reported. The devices studied were fabricated by a self-aligned gate process. Transconductances as large as 534 mS/mm were achieved with 0.4-μm devices. Two types of pseudomorphic AlGaAs/InGaAs/GaAs heterostructure are compared. One of them is used for modulation-doped FETs and the other for doped-channel FETs. It is found that the effects of electron velocity saturation are different for the two types of device due to the dominance of charge transfer and gate leakage in the conventional modulation-doped device. The experimental results are explained in the framework of a simple charge control model
  • Keywords
    III-V semiconductors; aluminium compounds; carrier mobility; field effect transistors; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; 0.4 to 10 micron; 534 mS; HFET; charge control model; charge transfer; doped-channel FETs; electron velocity saturation effect; enhancement-mode heterostructure field-effect transistors; gate leakage; gate lengths; gate-length scaling; modulation-doped FETs; pseudomorphic AlGaAs-InGaAs-GaAs heterostructure; self-aligned gate process; semiconductor; transconductance; Electrons; Epitaxial layers; FETs; Force sensors; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs; Signal processing; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.47754
  • Filename
    47754