DocumentCode
1146363
Title
Recording performance and process tolerance of dual-stripe MR heads
Author
Guo, Yhin ; Hsu, Yimin ; Ju, Kochan
Author_Institution
Headway Technol. Inc., Milpitas, CA, USA
Volume
32
Issue
1
fYear
1996
fDate
1/1/1996 12:00:00 AM
Firstpage
31
Lastpage
37
Abstract
In this work, we present an analysis of the recording performance and process tolerance of shielded dual-stripe MR heads. Using a micromagnetic model, we study isolated read-back pulses and the dependence of the peak asymmetry on both mismatch of the two MR stripes and off-track misalignment. Results show as long as the two MR stripes are away from their saturation regions, the differential mode of the output does not have severe peak asymmetry caused by mismatch of the two MR stripes. The off-track performance study shows that peak asymmetry is also very small with up to 0.5 μm read-to-write misalignment. The linear resolution is found to be comparable to that of SAL-biased MR heads and insensitive to the spacer thickness between the two MR stripes
Keywords
magnetic heads; magnetic shielding; magnetoresistive devices; differential mode; dual-stripe MR heads; linear resolution; micromagnetic model; off-track misalignment; peak asymmetry; process tolerance; read-back pulses; read-to-write misalignment; recording performance; saturation regions; shielded heads; Analytical models; Dielectrics; Fabrication; Harmonics suppression; Isolation technology; Magnetic heads; Magnetization; Magnetoresistance; Micromagnetics; Performance analysis;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.477546
Filename
477546
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