• DocumentCode
    1148235
  • Title

    Demonstration, analysis, and device design considerations for independent DG MOSFETs

  • Author

    Masahara, Meishoku ; Liu, Yongxun ; Sakamoto, Kunihiro ; Endo, Kazuhiko ; Matsukawa, Takashi ; Ishii, Kenichi ; Sekigawa, Toshihiro ; Yamauchi, Hiromi ; Tanoue, Hisao ; Kanemaru, Seigo ; Koike, Hanpei ; Suzuki, Eiichi

  • Author_Institution
    Nat. Inst. of Adv. Ind. Sci. & Technol., Ibaraki, Japan
  • Volume
    52
  • Issue
    9
  • fYear
    2005
  • Firstpage
    2046
  • Lastpage
    2053
  • Abstract
    This paper describes a comprehensive study on the threshold voltage (Vth) controllability of four-terminal-driven double-gate (DG) MOSFETs (4T-XMOSFETs) with independently switched DGs. Two types of 4T-XMOSFETs (fin and vertical) are experimentally demonstrated and their Vth controllability is thoroughly investigated in relation to the initial Vth in the DG-mode based on comprehensible modeling of the devices. Based on the investigation and simulated predictions, device design guidelines for 4T-XMOSFETs are proposed. Decreasing the workfunction of the DGs and increasing the oxide thickness of the second gate (Tox2) are preferable for improving the performance of the 4T-XMOSFET. The optimum workfunction of DGs for attaining low Ioff(stand-by) and high Ion(active) under the limited Vg2 condition is also proposed.
  • Keywords
    MOSFET; high-speed integrated circuits; leakage currents; semiconductor device models; work function; 4T-XMOSFETs; DG MOSFETs; FinFET; device design guidelines; four-terminal-driven double-gate MOSFETs; gate oxide thickness; gate workfunction; independent double-gate MOSFET; optimum workfunction; threshold voltage controllability; vertical DGMOSFET; Controllability; Degradation; Energy consumption; Flexible printed circuits; Guidelines; Leakage current; MOSFETs; Predictive models; Threshold voltage; Very large scale integration; 4T-XMOSFET; FinFET; XMOSFET; gate workfunction; independent double-gate (DG) MOSFET; second gate oxide thickness; vertical DGMOSFET;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2005.855063
  • Filename
    1499093