DocumentCode
1152490
Title
Pressure dependency of the NF3 -H2 transverse-discharge pulse-initiated HF chemical laser
Author
Pearson, Richard K. ; Cowles, J.O. ; Hermann, G.L. ; Pettipiece, K.J. ; Gregg, D.W.
Author_Institution
University of California, Livermore, CA, USA
Volume
9
Issue
7
fYear
1973
fDate
7/1/1973 12:00:00 AM
Firstpage
723
Lastpage
730
Abstract
The pressure dependency of the performance of the NF3 -H2 chemical-laser system has been evaluated. The laser energies at various chemical compositions and initiation discharge energies are presented as functions of Pressure. Overall efficiency, laser pulsewidth, and effects of additive gases are also presented. For all compositions the laser energy maximized at a pressure
which was observed to be dependent on the pulsewidth of the initiation discharge. At pressures below
the laser energy was proportional to the partial pressure of NF3 or H2 . No change in slope of the laser energy versus pressure curve was observed in going from low-pressure nonexploding regimes to high-pressure exploding regimes, implying that the reactions causing the explosion did not contribute to the lasing. Lasing usually occurred in two peaks, the first containing
lines and the second containing
and
lines. These data indicate that lasing is due to the reaction sequence: 1)
; and 3)
.
which was observed to be dependent on the pulsewidth of the initiation discharge. At pressures below
the laser energy was proportional to the partial pressure of NF
lines and the second containing
and
lines. These data indicate that lasing is due to the reaction sequence: 1)
; and 3)
.Keywords
Chemical lasers; Gas lasers; Hafnium; Hydrogen; Laser excitation; Laser modes; Laser transitions; Noise measurement; Optical pulses; Space vector pulse width modulation;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1973.1077725
Filename
1077725
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