• DocumentCode
    1153244
  • Title

    Experimental Investigation on the Quasi-Ballistic Transport: Part II—Backscattering Coefficient Extraction and Link With the Mobility

  • Author

    Barral, Vincent ; Poiroux, Thierry ; Munteanu, Daniela ; Autran, Jean-Luc ; Deleonibus, Simon

  • Author_Institution
    CEA-Lab. d´´Electron. et Technol. de´´ Inf., MINATEC, Grenoble
  • Volume
    56
  • Issue
    3
  • fYear
    2009
  • fDate
    3/1/2009 12:00:00 AM
  • Firstpage
    420
  • Lastpage
    430
  • Abstract
    Using a new extraction methodology taking into account multisubband population and carrier degeneracy, we have experimentally determined backscattering coefficients, ballistic ratios, and injection velocities of n- and p-FDSOI devices with gate lengths down to 30 nm in the saturated and, for the first time, in the linear regimes. The evolution of these quasi-ballistic parameters is examined as a function of the inversion charge in the channel and at temperatures ranging from 50 to 293 K, showing stronger ballistic ratios in the saturated regime than in the linear one. We particularly focus on the linear regime, and a model linking ballisticity ratios and effective mobility is proposed and validated experimentally for different gate lengths. According to the experimental evaluation of the device mean-free path and its evolution with both the inversion charge in the channel and the temperature, we investigate the mobility degradation with decreasing gate lengths, highlighting the importance of Coulomb scattering on this unexpected mobility behavior.
  • Keywords
    MOSFET; electron backscattering; feature extraction; silicon-on-insulator; Coulomb scattering; SOI MOSFET; backscattering coefficient extraction; mean-free path; mobility degradation; n-FDSOI devices; p-FDSOI devices; quasi-ballistic transport; size 30 nm; temperature 50 K to 293 K; Backscatter; Degradation; Electrostatics; Joining processes; Laboratories; MOSFETs; Microelectronics; Scattering; Silicon on insulator technology; Temperature distribution; Backscattering coefficient; SOI MOSFETs; ballistic ratio; injection velocity; linear regime; mean-free path; mobility;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.2011682
  • Filename
    4781549