DocumentCode
1164389
Title
Highly doped 1.55 μm GaxIn1-xAs/InP distributed Bragg reflector stacks
Author
Guy, P. ; Woodbridge, Karl ; Hopkinson, Mark
Author_Institution
Dept. of Electron. & Electr. Eng., Univ. Coll. London
Volume
30
Issue
18
fYear
1994
fDate
9/1/1994 12:00:00 AM
Firstpage
1526
Lastpage
1527
Abstract
The authors have investigated 20 period lattice matched mirror stacks doped to 5×1018 cm-1 and 1019 cm-1 at 1.55 μm in GaxIn1-xAs/InP and have obtained greater than 95% reflectivity over 100 nm and peak reflectivities up to 98%
Keywords
III-V semiconductors; distributed Bragg reflector lasers; gallium arsenide; heavily doped semiconductors; indium compounds; integrated optoelectronics; mirrors; semiconductor lasers; 1.55 micron; GaxIn1-xAs/InP; GaInAs-InP; distributed Bragg reflector stacks; peak reflectivities; period lattice matched mirror stacks; reflectivity; semiconductor lasers;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19941055
Filename
317056
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