• DocumentCode
    1168254
  • Title

    Charge Yield and Related Phenomena Induced by Ionizing Radiation in SiO _2 Layers

  • Author

    Murat, M. ; Akkerman, A. ; Barak, J.

  • Author_Institution
    Soreq Nucl. Res. Center, Yavne´´el
  • Volume
    53
  • Issue
    4
  • fYear
    2006
  • Firstpage
    1973
  • Lastpage
    1980
  • Abstract
    Monte Carlo simulations are used to evaluate the spatial distributions of electron-hole pairs induced in SiO2 by energetic electrons, protons, heavy ions, and X-rays. These distributions are then used to estimate the charge yield as the fraction of surviving pairs in the presence of a biasing field. This approach eliminates the need to make a priori assumptions about the average distribution, rendering it suitable for cases to which neither the columnar nor the geminate models is applicable. In addition, we treat other total ionizing dose effects in SiO2, single hard error and the ionization by the fragments of p+Si nuclear interactions, in view of the charge yield of the involved particles
  • Keywords
    Monte Carlo methods; X-ray effects; dosimetry; electron beam effects; electron-hole recombination; nuclei with mass number 20 to 38; proton effects; proton-nucleus reactions; semiconductor device models; silicon compounds; Monte Carlo simulations; Si(p,X); SiO2; SiO2 layers; X-rays; biasing field; charge yield phenomena; electron-hole pairs; energetic electrons; energy deposition; geminate models; heavy ions; ionizing radiation; protons; recombination; single hard error; spatial distributions; straggling; total ionizing dose effects; Electrons; Energy exchange; Ionization; Ionizing radiation; Nuclear electronics; Predictive models; Protons; Spontaneous emission; X-rays; Yield estimation; Charge yield; electron-hole pairs; energy deposition; recombination; single hard error; straggling; total ionizing dose (TID);
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2006.875050
  • Filename
    1684046