DocumentCode
1169154
Title
Effect of side wall roughness in buried channel waveguides
Author
Ladouceur, F. ; Love, J.D. ; Senden, T.J.
Author_Institution
CEA-Technol. Avancees, Grenoble, France
Volume
141
Issue
4
fYear
1994
fDate
8/1/1994 12:00:00 AM
Firstpage
242
Lastpage
248
Abstract
An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data
Keywords
atomic force microscopy; etching; integrated optics; light scattering; masks; optical losses; optical waveguides; surface topography measurement; atomic force microscope; buried channel waveguides; edge roughness; etched BCWs; light attenuation; masks; measured data; rectangular-core buried channel waveguide fabrication masks; scattering loss; side wall roughness; statistical model;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings -
Publisher
iet
ISSN
1350-2433
Type
jour
DOI
10.1049/ip-opt:19941085
Filename
318010
Link To Document