• DocumentCode
    1172222
  • Title

    Extending two-element capacitance extraction method toward ultraleaky gate oxides using a short-channel length

  • Author

    Jung-Suk Goo ; Mantei, T. ; Wieczorek, K. ; En, W.G. ; Icel, A.B.

  • Author_Institution
    Technol. Dev. Group of Adv. Micro Devices Inc., Sunnyvale, CA, USA
  • Volume
    25
  • Issue
    12
  • fYear
    2004
  • Firstpage
    819
  • Lastpage
    821
  • Abstract
    This letter demonstrates that the conventional two-element lumped model can provide valid capacitance-voltage (C-V ) characteristics for gate oxides with large tunneling current, if the gate length is reduced. The two-element models generally suffer from severe distortion of C-V due to tunneling current, resulting in poor oxide thickness extraction. The distortion can be suppressed using high frequencies in series model or using short gate lengths in parallel model. Considering instrument limits and manufacturability, however, the parallel model is more desirable. The distortion can be completely suppressed up to 104 A/cm2 of tunneling current, using gate lengths shorter than 0.2 μm in parallel model.
  • Keywords
    MOSFET; capacitance measurement; tunnelling; MOS devices; MOSFETs; capacitance measurement; capacitance-voltage characteristics; oxide thickness extraction; short-channel length; thin-film capacitors; tunneling current; two-element capacitance extraction; two-element lumped model; ultraleaky gate oxides; Admittance; Capacitance; Capacitance-voltage characteristics; Capacitors; Dielectrics; Frequency; Impedance; Leakage current; MOSFETs; Tunneling; Capacitance measurement; MOS devices; MOSFETs; thin-film capacitors; tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2004.839209
  • Filename
    1362786