DocumentCode
1174261
Title
1.5 μm laser on GaAs with GaInNAsSb quinary quantum well
Author
Li, L.H. ; Sallet, V. ; Patriarche, G. ; Largeau, L. ; Bouchoule, S. ; Merghem, K. ; Travers, L. ; Harmand, J.C.
Author_Institution
Lab. de Photonique et de Nanostructures, CNRS, Marcoussis, France
Volume
39
Issue
6
fYear
2003
fDate
3/20/2003 12:00:00 AM
Firstpage
519
Lastpage
520
Abstract
A 1.50 μm broad area edge emitting laser is demonstrated with a structure grown by molecular beam epitaxy on a GaAs substrate. The active region is based on a single GaInNAsSb quantum well. The threshold current density is 3.5 kA/cm2. Output power over 22 mW per facet is achieved.
Keywords
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; laser transitions; molecular beam epitaxial growth; quantum well lasers; 1.5 micron; 22 mW; GaAs substrate; GaInNAsSb quinary quantum well; broad area laser; edge emitting laser; molecular beam epitaxy; semiconductor laser;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20030367
Filename
1192205
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