• DocumentCode
    1176064
  • Title

    Radiation damage of amorphous silicon photodiode sensors

  • Author

    Boudry, J.M. ; Antonuk, L.E.

  • Author_Institution
    Dept. of Radiat. Oncology, Michigan Univ., Ann Arbor, MI, USA
  • Volume
    41
  • Issue
    4
  • fYear
    1994
  • fDate
    8/1/1994 12:00:00 AM
  • Firstpage
    703
  • Lastpage
    707
  • Abstract
    The effect of 60Co radiation on the leakage current behavior of hydrogenated amorphous silicon photodiode sensors has been investigated. These sensors, with an n-i-p construction, are identical to those used on two-dimensional, pixelated imaging arrays currently under development. Sensor leakage current is reported as a function of dose up to a cumulative dose of ~3×106 cGy. Following the irradiation, the effect of room-temperature annealing on the leakage current was quantitatively studied. Finally, sensor noise measurements prior to and after the irradiation are also reported. The implications of this study for radiotherapy imaging are discussed
  • Keywords
    gamma-ray effects; semiconductor counters; Si:H; amorphous Si photodiode sensors; leakage current behavior; n-i-p construction; pixelated imaging arrays; radiotherapy imaging; room-temperature annealing; sensor leakage current; Amorphous silicon; Annealing; Chemical sensors; FETs; Image sensors; Leakage current; Photodiodes; Pixel; Sensor arrays; X-ray imaging;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.322792
  • Filename
    322792