DocumentCode
1176064
Title
Radiation damage of amorphous silicon photodiode sensors
Author
Boudry, J.M. ; Antonuk, L.E.
Author_Institution
Dept. of Radiat. Oncology, Michigan Univ., Ann Arbor, MI, USA
Volume
41
Issue
4
fYear
1994
fDate
8/1/1994 12:00:00 AM
Firstpage
703
Lastpage
707
Abstract
The effect of 60Co radiation on the leakage current behavior of hydrogenated amorphous silicon photodiode sensors has been investigated. These sensors, with an n-i-p construction, are identical to those used on two-dimensional, pixelated imaging arrays currently under development. Sensor leakage current is reported as a function of dose up to a cumulative dose of ~3×106 cGy. Following the irradiation, the effect of room-temperature annealing on the leakage current was quantitatively studied. Finally, sensor noise measurements prior to and after the irradiation are also reported. The implications of this study for radiotherapy imaging are discussed
Keywords
gamma-ray effects; semiconductor counters; Si:H; amorphous Si photodiode sensors; leakage current behavior; n-i-p construction; pixelated imaging arrays; radiotherapy imaging; room-temperature annealing; sensor leakage current; Amorphous silicon; Annealing; Chemical sensors; FETs; Image sensors; Leakage current; Photodiodes; Pixel; Sensor arrays; X-ray imaging;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.322792
Filename
322792
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