DocumentCode
118250
Title
Influence of Cu orientation on the growth of Cu-Sn intermetallics and interfacial reaction of Cu/Sn diffusion couple
Author
Shan Yang ; Li Peng ; Yishi Tao ; Anmin Hu ; Ming Li
Author_Institution
Sch. of Mater. Sci. & Eng., Shanghai Jiao Tong Univ., Shanghai, China
fYear
2014
fDate
12-15 Aug. 2014
Firstpage
121
Lastpage
124
Abstract
The copper substrates with different preferred orientations (200) and (220) were prepared and the interfacial reactions of the Cu(200)/Sn and Cu(220)/Sn diffusion couples were studied after annealing at 423K. The thickness and morphology of the intermetallic compounds were investigated. The appearance of the Cu3Sn was observed at Cu(220)/Sn interface after aged for 4 hours and then the thickness of Cu3Sn grown quickly. There is less Cu3Sn at Cu(200)/Sn interface but the Cu6Sn5 grown quickly and quantities of voids gathered into cracks. The preferred orientations of the Cu substrates are believed to be the reasons of the different interfacial reactions phenomena.
Keywords
annealing; chemical reactions; copper alloys; diffusion; integrated circuit packaging; solders; tin alloys; Cu-Sn; annealing; couple diffusion; interfacial reaction phenomena; intermetallic compound morphology; intermetallic compound thickness; intermetallic growth; temperature 423 K; time 4 hour; voids; Aging; Annealing; Copper; Crystals; Morphology; Substrates; Tin; electroplate; interfacial reactions; orientation;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Packaging Technology (ICEPT), 2014 15th International Conference on
Conference_Location
Chengdu
Type
conf
DOI
10.1109/ICEPT.2014.6922618
Filename
6922618
Link To Document