• DocumentCode
    118250
  • Title

    Influence of Cu orientation on the growth of Cu-Sn intermetallics and interfacial reaction of Cu/Sn diffusion couple

  • Author

    Shan Yang ; Li Peng ; Yishi Tao ; Anmin Hu ; Ming Li

  • Author_Institution
    Sch. of Mater. Sci. & Eng., Shanghai Jiao Tong Univ., Shanghai, China
  • fYear
    2014
  • fDate
    12-15 Aug. 2014
  • Firstpage
    121
  • Lastpage
    124
  • Abstract
    The copper substrates with different preferred orientations (200) and (220) were prepared and the interfacial reactions of the Cu(200)/Sn and Cu(220)/Sn diffusion couples were studied after annealing at 423K. The thickness and morphology of the intermetallic compounds were investigated. The appearance of the Cu3Sn was observed at Cu(220)/Sn interface after aged for 4 hours and then the thickness of Cu3Sn grown quickly. There is less Cu3Sn at Cu(200)/Sn interface but the Cu6Sn5 grown quickly and quantities of voids gathered into cracks. The preferred orientations of the Cu substrates are believed to be the reasons of the different interfacial reactions phenomena.
  • Keywords
    annealing; chemical reactions; copper alloys; diffusion; integrated circuit packaging; solders; tin alloys; Cu-Sn; annealing; couple diffusion; interfacial reaction phenomena; intermetallic compound morphology; intermetallic compound thickness; intermetallic growth; temperature 423 K; time 4 hour; voids; Aging; Annealing; Copper; Crystals; Morphology; Substrates; Tin; electroplate; interfacial reactions; orientation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology (ICEPT), 2014 15th International Conference on
  • Conference_Location
    Chengdu
  • Type

    conf

  • DOI
    10.1109/ICEPT.2014.6922618
  • Filename
    6922618