DocumentCode
1182940
Title
Improvement in the optical quality of GaInNAs/GaInAs quantum well structures by interfacial strain reduction
Author
Navaretti, P. ; Liu, H.Y. ; Hopkinson, M. ; Rrez, M. Gutié ; David, J.P.R. ; Hill, G. ; Herrera, M. ; Lez, D. Gonzá ; García, R.
Author_Institution
Dept. of Electron. & Electr. Eng., Univ. of Sheffield, UK
Volume
151
Issue
5
fYear
2004
Firstpage
301
Lastpage
304
Abstract
The authors report on the use of thin (2 nm) layers with intermediate strain placed between the barriers and the quantum wells of GaInNAs/GaInNAs structures in order to reduce the effect of strain on the quantum wells. A comparison between samples with and without these strain-mediating layers has been performed using various optical and structural techniques, such as photoluminescence, high-resolution X-ray diffractometry and transmission electron microscopy. The results show that the introduction of strain-mediating layers brings beneficial effects to the structural quality of the active region which, in turn, is reflected by a two orders of magnitude improvement in the photoluminescence intensity. It is thought that this structural design approach can be successfully used to obtain high performance 1.3 and 1.55 μm lasers based on dilute nitride materials grown on GaAs.
Keywords
III-V semiconductors; X-ray diffraction; gallium compounds; indium compounds; photoluminescence; semiconductor quantum wells; transmission electron microscopy; wide band gap semiconductors; GaInNAs-GaInNAs; GaInNAs/GaInAs quantum well structures; X-ray diffractometry; dilute nitride materials; interfacial strain reduction; photoluminescence; transmission electron microscopy;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings -
Publisher
iet
ISSN
1350-2433
Type
jour
DOI
10.1049/ip-opt:20040934
Filename
1367373
Link To Document