• DocumentCode
    1186527
  • Title

    Effects of floating body on double polysilicon partially depleted SOI nonvolatile memory cell

  • Author

    Chan, Alain Chun-Keung ; Chan, Mansun

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
  • Volume
    24
  • Issue
    2
  • fYear
    2003
  • Firstpage
    75
  • Lastpage
    77
  • Abstract
    The floating-body effect of nonvolatile memory cells fabricated using partially depleted silicon-on-insulator (SOI) technology has been investigated using two-dimensional numerical device simulation. Compared with similar bulk devices, the floating-body effect of partially depleted SOI MOSFETs introduces instability in the value of the drain current during sensing and extra hot-electron gate current in programming. The effects of the drain-current instability on the error margins in read operation are studied. The floating-body effect is found to be heavily dependent on biasing condition.
  • Keywords
    MOS memory circuits; cellular arrays; elemental semiconductors; hot carriers; semiconductor device models; silicon; silicon-on-insulator; Si; biasing condition; double polysilicon structure; drain current; floating body; hot-electron gate current; nonvolatile memory cell; partially depleted SOI MOSFETs; two-dimensional numerical device simulation; Doping; Fluctuations; MOSFETs; Medical simulation; Nonvolatile memory; Numerical simulation; Silicon on insulator technology; Substrates; System-on-a-chip; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2003.808840
  • Filename
    1196021