• DocumentCode
    1187057
  • Title

    Elimination of kink phenomena and drain current hysteresis in InP-based HEMTs with a direct ohmic structure

  • Author

    Sawada, Ken ; Arai, Tomoyuki ; Takahashi, Tsuyoshi ; Hara, Naoki

  • Author_Institution
    Fujitsu Labs. Ltd., Kanagawa, Japan
  • Volume
    50
  • Issue
    2
  • fYear
    2003
  • Firstpage
    310
  • Lastpage
    314
  • Abstract
    We eliminated kink phenomena and Ids hysteresis in a double-doped InP-based HEMT without degrading its frequency performance by fabricating direct ohmic contacts in the InGaAs channel. A direct ohmic structure lets us control current paths in the device and relax the electric field at the recess edge of the drain side. As a result, we can suppress impact ionization and decrease the hole currents that originate from the high electric field region at the recess edge of the drain side. Kink phenomena are eliminated in the direct ohmic structure. We also suggest a hole trap mechanism to explain the appearance of hysteresis in the I-V characteristic of the conventional nonalloyed ohmic structure device.
  • Keywords
    III-V semiconductors; doping profiles; high electron mobility transistors; hysteresis; impact ionisation; indium compounds; ohmic contacts; I-V characteristic hysteresis; Ids hysteresis; InGaAs; InGaAs channel; InP; InP-based HEMT; MODFET; Ni-AuGe-Au; direct ohmic structure; double-doped HEMT; drain current hysteresis elimination; high electric field region; hole current reduction; hole trap mechanism; impact ionization suppression; kink phenomena elimination; Etching; Frequency; Gold; HEMTs; Hysteresis; Impact ionization; Indium compounds; Indium gallium arsenide; MODFETs; Optical fiber communication;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2002.808555
  • Filename
    1196071