• DocumentCode
    1190022
  • Title

    Low threshold current density 1.3-μm strained-layer quantum-well lasers using n-type modulation doping

  • Author

    Yamamoto, T. ; Watanabe, T. ; Ide, S. ; Tanaka, I. ; Nobuhara, H. ; Wakao, K.

  • Author_Institution
    Fujitsu Labs. Ltd., Atsugi, Japan
  • Volume
    6
  • Issue
    10
  • fYear
    1994
  • Firstpage
    1165
  • Lastpage
    1166
  • Abstract
    We have developed 1.3 μm n-type modulation-doped strained-layer quantum-well lasers. Modulation-doped lasers with long cavities (low threshold gain) exhibit much lower threshold current densities than conventional lasers with undoped barrier layers. The lowest threshold current density we obtained was 250 A/cm2 for 1500 μm long lasers with five quantum wells. The estimated threshold current density for an infinite cavity length was 38 A/m2/well. This is the lowest value for InGaAsP-InGaAsP and InGaAs-InGaAsP quantum well lasers to our knowledge.
  • Keywords
    current density; doping profiles; laser cavity resonators; laser transitions; semiconductor lasers; 1.3 micron; 1500 micron; InGaAs-InGaAsP; InGaAsP-InGaAsP; long cavities; low threshold current density; n-type modulation doping; strained-layer quantum-well lasers; Charge carrier density; Density measurement; Doping profiles; Electrons; Epitaxial layers; Indium phosphide; Optical modulation; Quantum well lasers; Silicon; Threshold current;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.329626
  • Filename
    329626