DocumentCode
1190026
Title
Magnetization switching and tunneling magnetoresistance effects of MTJs with synthetic antiferromagnet free layers consisting of amorphous CoFeSiB
Author
Rhee, J.R. ; Hwang, J.Y. ; Kim, S.S. ; Kim, M.Y. ; Chun, B.S. ; Yoo, I.S. ; Oh, B.S. ; Kim, Y.K. ; Kim, T.W. ; Park, W.J.
Author_Institution
Dept. of Phys., Sook-Myung Women´´s Univ., Seoul, South Korea
Volume
41
Issue
10
fYear
2005
Firstpage
2685
Lastpage
2687
Abstract
Magnetic tunnel junctions (MTJs), which consisted of amorphous CoFeSiB layers, were investigated. The CoFeSiB layers were used to substitute for the traditionally used CoFe and/or NiFe layers with an emphasis given on understanding the effect of the amorphous free layer on the switching characteristics of the MTJs. CoFeSiB has a lower saturation magnetization (Ms:560 emu/cm3) and a higher anisotropy constant (Ku:2 800 erg/cm3) than CoFe and NiFe, respectively. An exchange coupling energy (Jex) of -0.003 erg/cm2 was observed by inserting a 1.0 nm Ru layer in between CoFeSiB layers. In the Si-SiO2-Ta 45/Ru 9.5/IrMn 10/CoFe 7/AlOx/CoFeSiB 7 or CoFeSiB (t)/Ru 1.0/CoFeSiB (7-t)/Ru 60 (in nanometers) MTJs structure, it was found that the size dependence of the switching field originated in the lower Jex using the experimental and simulation results. The CoFeSiB synthetic antiferromagnet structures were proved to be beneficial for the switching characteristics such as reducing the coercivity (Hc) and increasing the sensitivity in micrometer size, even in submicrometer sized elements.
Keywords
amorphous magnetic materials; antiferromagnetic materials; magnetic multilayers; magnetic switching; magnetic tunnelling; magnetisation; micromagnetics; sputtering; 1.0 nm; CoFe; MTJ; NiFe; Ru; Si-SiO2-Ta-Ru-IrMn-CoFe-AlO-CoFeSiB; anisotropy constant; antiferromagnet free layers; exchange coupling energy; magnetic tunnel junctions; magnetization switching; micrometer size; saturation magnetization; synthetic antiferromagnet structures; tunneling magnetoresistance effects; Amorphous magnetic materials; Amorphous materials; Antiferromagnetic materials; Magnetic anisotropy; Magnetic switching; Magnetic tunneling; Perpendicular magnetic anisotropy; Saturation magnetization; Soft magnetic materials; Tunneling magnetoresistance; Amorphous ferromagnet; CoFeSiB; magnetic random access memory (MRAM); switching field; synthetic antiferromagnet (SAF); tunneling magnetoresistance (TMR);
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2005.855296
Filename
1519088
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