DocumentCode
1192214
Title
Negative differential resistance of GaAs/AlxGa1-xAs multiquantum well structures under high power photoexcitation: structure optimisation for an oscillator
Author
Goswami, Suparna ; Davis, Lisa ; Hong, Seong-Kwan ; Singh, Jaskirat ; Bhattacharya, P.K. ; Haddad, G.I.
Author_Institution
Michigan Univ., Ann Arbor, MI, USA
Volume
28
Issue
10
fYear
1992
fDate
5/7/1992 12:00:00 AM
Firstpage
915
Lastpage
916
Abstract
A study is presented of the photocurrent behaviour of p-i-n diodes having GaAs/AlxGa1-xAs MQW absorption regions for varying incident power, incident wavelength and barrier height, given by the Al fraction x. Optimum results for applications in high power oscillators are expected to be obtained for 0.10.15Ga0.85As barriers.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; negative resistance; p-i-n diodes; photoconductivity; photoelectric devices; semiconductor quantum wells; GaAs-Al 0.15Ga 0.85As; MQW absorption regions; NDR; barrier height; high power oscillators; high power photoexcitation; incident power; incident wavelength; multiquantum well structures; negative differential resistance; optically controlled oscillators; p-i-n diodes; performance characteristics; photocurrent behaviour; structure optimisation;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19920580
Filename
137187
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