DocumentCode
1197975
Title
Pulse-doped AlGaAs/InGaAs pseudomorphic MODFETs
Author
Moll, Nick ; Hueschen, Mark R. ; Fischer-Colbrie, Alice
Author_Institution
Hewlett-Packard Lab., Palo Alto, CA, USA
Volume
35
Issue
7
fYear
1988
fDate
7/1/1988 12:00:00 AM
Firstpage
879
Lastpage
886
Abstract
MODFETs have been fabricated using heterojunctions consisting of AlGaAs and pseudomorphic InGaAs, grown on GaAs substrates. The large conduction band discontinuity (about 0.46 eV for 25% In and Al concentration) leads to a 2-D electron density as high as 2.3×10 12 cm-2, with electron mobilities of 7000 and 16000 cm2/V-s at 300 and 77 K, respectively. Such a high electron density in combination with reasonable transport properties leads to MODFETs with exceptional characteristics. Devices with 0.15-0.25-μm gate length have room-temperature drain currents as high as 600 mA/mm and room-temperature transconductance as high as 500 mS/mm. The f T is as high as 98 GHz, as determined by 20-dB/decade extrapolation of microwave data taken to 25 GHz. A comparison of the effect of bias on the total delay through standard and pseudomorphic MODFETs suggests that the excellent microwave performance exhibited by the pseudomorphic device arises from a reduction in parasitic and drain delays and not from a higher electron velocity under the gate
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor doping; solid-state microwave devices; 0.46 eV; 150 to 250 nm; 2-D electron density; 300 K; 77 K; 98 GHz; AlGaAs-InGaAs; GaAs substrates; HEMT; conduction band discontinuity; effect of bias; electron mobilities; gate length; microwave performance; pseudomorphic InGaAs; pseudomorphic MODFETs; pulse doping; room-temperature drain currents; room-temperature transconductance; semiconductor; Delay effects; Electron mobility; Extrapolation; Gallium arsenide; HEMTs; Heterojunctions; Indium gallium arsenide; MODFETs; Microwave devices; Transconductance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.3339
Filename
3339
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