DocumentCode
121354
Title
Patterned nanostructure lasers by MOCVD
Author
Coleman, J.J.
Author_Institution
Univ. of Illinois, Urbana, IL, USA
fYear
2014
fDate
17-21 Aug. 2014
Firstpage
81
Lastpage
82
Abstract
Metalorganic chemical vapor deposition (MOCVD) has been the epitaxial growth method of choice for lasers and other photonic devices for nearly forty years. Here we very briefly review selected aspects of MOCVD selective area epitaxy (SAE) and nanostructure self-assembly, to patterned nano-structure growth.
Keywords
MOCVD; nanophotonics; quantum dot lasers; vapour phase epitaxial growth; MOCVD; epitaxial growth method; metalorganic chemical vapor deposition; nanostructure growth; nanostructure self-assembly; patterned nanostructure lasers; photonic devices; selective area epitaxy; Micromechanical devices; Nanophotonics;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics (OMN), 2014 International Conference on
Conference_Location
Glasgow
ISSN
2160-5033
Print_ISBN
978-0-9928-4140-9
Type
conf
DOI
10.1109/OMN.2014.6924603
Filename
6924603
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