• DocumentCode
    1218292
  • Title

    Effect of diamond nucleation process on propagation losses of AlN/diamond SAW filter

  • Author

    Elmazria, Omar ; Hakiki, M.E. ; Mortet, Vincent ; Assouar, Badreddine M. ; Nesladek, Milos ; Vanecek, Milan ; Bergonzo, Philippe ; Alnot, Patrick

  • Author_Institution
    Univ. H. Poincare - Nancy, Vandoeuvre-les-Nancy, France
  • Volume
    51
  • Issue
    12
  • fYear
    2004
  • Firstpage
    1704
  • Lastpage
    1709
  • Abstract
    In this work, the effect of a diamond nucleation process on freestanding aluminium nitride (AlN)/diamond surface acoustic wave (SAW) device performances was studied. Before diamond deposition, silicon (Si) substrates have been mechanically nucleated, using an ultrasonic vibration table with submicron diamond slurry, and bias-enhanced nucleated (BEN). Freestanding diamond layers obtained on mechanically scratched Si substrates exhibit a surface roughness of R/sub MS/=13 nm, whereas very low surface roughness (as low as R/sub MS//spl les/1 nm) can be achieved on a freestanding BEN diamond layer. Propagation losses have been measured as a function of the operating frequency for the two nucleation techniques. Dispersion curves of phase velocities and electromechanical coupling coefficient (K/sup 2/) were determined experimentally and by calculation as a function of normalized thickness AlN film (kh/sub AlN/=2/spl pi/h/sub AlN///spl lambda/). Experimental results show that the propagation losses strongly depend on the nucleation technique, and that these losses are weakly increased with frequency when the BEN technique is used.
  • Keywords
    acoustic dispersion; acoustic wave propagation; aluminium compounds; chemical vapour deposition; diamond; losses; nucleation; piezoelectric thin films; semiconductor thin films; surface acoustic wave filters; surface roughness; AlN film; AlN-C; AlN-diamond SAW filter propagation loss; Si; bias enhanced nucleation; diamond deposition; diamond nucleation; dispersion curve; electromechanical coupling coefficient; mechanically scratched Si substrate; phase velocity; silicon substrate; submicron diamond slurry; surface acoustic wave device; surface roughness; ultrasonic vibration; Acoustic waves; Aluminum; Frequency; Propagation losses; Rough surfaces; SAW filters; Substrates; Surface acoustic wave devices; Surface acoustic waves; Surface roughness;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/TUFFC.2004.1386688
  • Filename
    1386688