Confirmation of the INRiM and PTB Determinations of the Si Lattice Parameter

Author

Hao, Liangliang ; Macfarlane, J.C. ; Gallop, John C. ; Cox, D. ; Joseph-Franks, Patrick ; Hutson, David ; Chen, Jiann-Jong ; Lam, S.K.H.

Author_Institution

National Phys. Lab., Teddington

Volume

56

Issue

2

fYear

2007

fDate

4/1/2007 12:00:00 AM

Firstpage

230

Lastpage

234

Abstract

As metrology extends toward the nanoscale, a number of potential applications and new challenges arise. By combining photolithography with focused ion beam and/or electron beam methods, superconducting quantum interference devices (SQUIDs) with loop dimensions down to 200 nm and superconducting bridge dimensions of the order 80 nm have been produced. These SQUIDs have a range of potential applications. As an illustration, we describe a method for characterizing the effective area and the magnetic penetration depth of a structured superconducting thin film in the extreme limit, where the superconducting penetration depth A is much greater than the film thickness and is comparable with the lateral dimensions of the device

Keywords

SQUIDs; electron beam applications; focused ion beam technology; magnetic field effects; nanotechnology; photolithography; superconducting thin films; 200 nm; SQUID; electron beam methods; focused ion beam; loop dimensions; magnetic field effects; nanotechnology; photolithography; superconducting devices; superconducting nanostructures; superconducting quantum interference devices; superconducting thin films; Bridges; Electron beams; Interference; Ion beams; Lattices; Lithography; Magnetic devices; Metrology; SQUIDs; Superconducting devices; Avogadro´s constant; Si lattice parameter; combined X-ray and optical interferometry;

fLanguage

English

Journal_Title

Instrumentation and Measurement, IEEE Transactions on

Publisher

ieee

ISSN

0018-9456

Type

jour

DOI

10.1109/TIM.2007.890618

Filename

4126828