DocumentCode
1232562
Title
Design of wireless on-wafer submicron characterization system
Author
Moore, Brian ; Margala, Martin ; Backhouse, Chris
Author_Institution
Univ. of Alberta, Edmonton, Alta.
Volume
13
Issue
2
fYear
2005
Firstpage
169
Lastpage
180
Abstract
A wireless technique for the testing of very large scale ICs and wafers is presented. This test technique uses standard CMOS to achieve wireless parametric testing. This technique has virtually no area overhead, minimal power requirements, and no process or design changes are required. Most compelling is that wafer contact is not required, thereby enabling the in-line process control/monitoring of the manufacture of VLSI wafers or chips. Simulations of representative VLSI antenna designs are presented along with experimental results from the implementation of the antenna coupling and communications link. Also presented are specific circuit simulations showing the characteristics of operation under a range of conditions. The technique is demonstrated experimentally in discrete form with operation at voltages as low as 1 V with submilliwatt power levels. This technique can be implemented with a requirement of 1/10 000th the area of a Pentium-class VLSI circuit, allowing contactless testing of wafers before packaging
Keywords
CMOS integrated circuits; VLSI; antennas; chip scale packaging; integrated circuit design; integrated circuit testing; process control; process monitoring; wireless LAN; CMOS circuit; Pentium-class VLSI circuit; VLSI antenna designs; VLSI chip manufacture; VLSI wafer manufacture; antenna coupling; communications link; contactless testing; in-line process control; in-line process monitoring; minimal power requirements; packaging; specific circuit simulations; submilliwatt power levels; very large scale integrated circuit testing; very large scale integrated wafer testing; wireless method; wireless on-wafer submicron system; wireless parametric testing; CMOS technology; Circuit simulation; Circuit testing; Coupling circuits; Large-scale systems; Low voltage; Manufacturing processes; Process control; Process design; Very large scale integration; CMOS; VLSI; faults; low-voltage; wireless process control monitor;
fLanguage
English
Journal_Title
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher
ieee
ISSN
1063-8210
Type
jour
DOI
10.1109/TVLSI.2004.840780
Filename
1393018
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