DocumentCode
1242561
Title
Subwavelength Silica-Based Optical Waveguide With a Multilayered Buffer for Sharp Bending
Author
Dai, Daoxin
Author_Institution
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Volume
27
Issue
13
fYear
2009
fDate
7/1/2009 12:00:00 AM
Firstpage
2489
Lastpage
2494
Abstract
A subwavelength SiO2-based optical waveguide with an air cladding and a multilayered buffer is presented. This multilayered buffer includes alternating low and high refractive index dielectric layers. The thicknesses of these dielectric layers are chosen optimally by using genetic algorithm so that the theoretical leakage loss of the present optical waveguide is minimized (<0.001 dB/mm at the central wavelength, e.g., 1550 nm). The modal analysis with a full-vectorial finite-difference method shows that the present SiO2 optical waveguide has the ability of sharp bending with a very small bending radius (~ 10 mum).
Keywords
bending; dielectric thin films; finite difference time-domain analysis; genetic algorithms; integrated optics; optical losses; optical multilayers; optical waveguides; silicon compounds; SiO2; air cladding; full-vectorial finite-difference method; genetic algorithm; high-refractive index dielectric layers; leakage loss; low-refractive index dielectric layers; modal analysis; multilayered buffer; photonic integration circuits; sharp bending; subwavelength silica-based optical waveguide; wavelength 1550 nm; ${rm SiO}_{2}$ ; Bending; genetic algorithm; leakage loss; multilayered;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2008.2011501
Filename
4815442
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