• DocumentCode
    1242561
  • Title

    Subwavelength Silica-Based Optical Waveguide With a Multilayered Buffer for Sharp Bending

  • Author

    Dai, Daoxin

  • Author_Institution
    State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
  • Volume
    27
  • Issue
    13
  • fYear
    2009
  • fDate
    7/1/2009 12:00:00 AM
  • Firstpage
    2489
  • Lastpage
    2494
  • Abstract
    A subwavelength SiO2-based optical waveguide with an air cladding and a multilayered buffer is presented. This multilayered buffer includes alternating low and high refractive index dielectric layers. The thicknesses of these dielectric layers are chosen optimally by using genetic algorithm so that the theoretical leakage loss of the present optical waveguide is minimized (<0.001 dB/mm at the central wavelength, e.g., 1550 nm). The modal analysis with a full-vectorial finite-difference method shows that the present SiO2 optical waveguide has the ability of sharp bending with a very small bending radius (~ 10 mum).
  • Keywords
    bending; dielectric thin films; finite difference time-domain analysis; genetic algorithms; integrated optics; optical losses; optical multilayers; optical waveguides; silicon compounds; SiO2; air cladding; full-vectorial finite-difference method; genetic algorithm; high-refractive index dielectric layers; leakage loss; low-refractive index dielectric layers; modal analysis; multilayered buffer; photonic integration circuits; sharp bending; subwavelength silica-based optical waveguide; wavelength 1550 nm; ${rm SiO}_{2}$ ; Bending; genetic algorithm; leakage loss; multilayered;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2008.2011501
  • Filename
    4815442