• DocumentCode
    1245515
  • Title

    Fabrication, characterization and analysis of low threshold current density 1.55-μm-strained quantum-well lasers

  • Author

    Mathur, Atul ; Dapkus, P.Daniel

  • Author_Institution
    Dept. of Electr. Eng.-Electrophys., Univ. of Southern California, Los Angeles, CA, USA
  • Volume
    32
  • Issue
    2
  • fYear
    1996
  • fDate
    2/1/1996 12:00:00 AM
  • Firstpage
    222
  • Lastpage
    226
  • Abstract
    Tertiarybutylarsine and tertiarybutylphosphine are less hazardous alternatives to arsine and phosphine as group V sources for crystal growth of InxGa1-xAsyP1-y alloys by metalorganic chemical vapor deposition. Compressive and tensile-strained quantum-well lasers emitting at 1.55 μm have been fabricated using these sources. Threshold current density as low as 93 A/cm2, transparency current density as low as 38 A/cm2 and internal efficiency of 91% were obtained for 1.5% compressive-strained single quantum-well lasers. These devices represent the best lasers emitting at this wavelength that have been reported in the literature. An analysis of some of the characteristics of these devices such as transparency current, differential gain and nonradiative recombination is also presented in this paper
  • Keywords
    III-V semiconductors; current density; epitaxial growth; gallium arsenide; gallium compounds; indium compounds; optical communication equipment; optical fabrication; quantum well lasers; semiconductor growth; tensile strength; transparency; 1.55 mum; 91 percent; InxGa1-xAsyP1-y alloys; InGaAsP; compressive-strained quantum-well lasers; compressive-strained single quantum-well lasers; crystal growth; differential gain; group V sources; internal efficiency; low threshold current density; metalorganic chemical vapor deposition; nonradiative recombination; strained quantum-well lasers; tensile-strained quantum-well lasers; tertiarybutylarsine; tertiarybutylphosphine; threshold current density; transparency current; transparency current density; Capacitive sensors; Chemical vapor deposition; Current density; Current measurement; Density measurement; Fabrication; Gallium alloys; Indium phosphide; Quantum well lasers; Radiative recombination; Temperature dependence; Tensile strain; Threshold current;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/3.481869
  • Filename
    481869