DocumentCode
1245515
Title
Fabrication, characterization and analysis of low threshold current density 1.55-μm-strained quantum-well lasers
Author
Mathur, Atul ; Dapkus, P.Daniel
Author_Institution
Dept. of Electr. Eng.-Electrophys., Univ. of Southern California, Los Angeles, CA, USA
Volume
32
Issue
2
fYear
1996
fDate
2/1/1996 12:00:00 AM
Firstpage
222
Lastpage
226
Abstract
Tertiarybutylarsine and tertiarybutylphosphine are less hazardous alternatives to arsine and phosphine as group V sources for crystal growth of InxGa1-xAsyP1-y alloys by metalorganic chemical vapor deposition. Compressive and tensile-strained quantum-well lasers emitting at 1.55 μm have been fabricated using these sources. Threshold current density as low as 93 A/cm2, transparency current density as low as 38 A/cm2 and internal efficiency of 91% were obtained for 1.5% compressive-strained single quantum-well lasers. These devices represent the best lasers emitting at this wavelength that have been reported in the literature. An analysis of some of the characteristics of these devices such as transparency current, differential gain and nonradiative recombination is also presented in this paper
Keywords
III-V semiconductors; current density; epitaxial growth; gallium arsenide; gallium compounds; indium compounds; optical communication equipment; optical fabrication; quantum well lasers; semiconductor growth; tensile strength; transparency; 1.55 mum; 91 percent; InxGa1-xAsyP1-y alloys; InGaAsP; compressive-strained quantum-well lasers; compressive-strained single quantum-well lasers; crystal growth; differential gain; group V sources; internal efficiency; low threshold current density; metalorganic chemical vapor deposition; nonradiative recombination; strained quantum-well lasers; tensile-strained quantum-well lasers; tertiarybutylarsine; tertiarybutylphosphine; threshold current density; transparency current; transparency current density; Capacitive sensors; Chemical vapor deposition; Current density; Current measurement; Density measurement; Fabrication; Gallium alloys; Indium phosphide; Quantum well lasers; Radiative recombination; Temperature dependence; Tensile strain; Threshold current;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/3.481869
Filename
481869
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