• DocumentCode
    1245561
  • Title

    A 100-MHz ultrasonic transducer array using ZnO thin films

  • Author

    Ito, Yukio ; Kushida, Keiko ; Sugawara, Kazuhiro ; Takeuchi, Hiroshi

  • Author_Institution
    Central Res. Lab., Hitachi Ltd., Tokyo, Japan
  • Volume
    42
  • Issue
    2
  • fYear
    1995
  • fDate
    3/1/1995 12:00:00 AM
  • Firstpage
    316
  • Lastpage
    324
  • Abstract
    A 100-MHz ultrasonic linear transducer array made from a piezoelectric zinc oxide thin film on a sapphire substrate was developed and evaluated. Epitaxial, high-acoustic quality 10-/spl mu/m-thick ZnO film layers were produced by rf-magnetron sputter deposition onto a (111)-oriented gold film (with a chromium adhesion layer) that was vacuum-evaporated onto a (0001) sapphire surface. We found that, in well-oriented growth of gold, it is important to control the chromium sublayer thickness (less than 5 nm). An array was constructed by photolithography with an appropriate etch. V-shaped grooves between adjacent elements were formed by using an anisotropic etchant (HCl and HNO/sub 3/-based) that preferentially etched the c-plane of ZnO. Typical array elements were 90 /spl mu/m wide, 3.2 mm long, and 10 /spl mu/m thick, and the pitch of an array was typically 100 /spl mu/m. Our fine uniform array resulted in uniform ultrasonic response of individual elements throughout the array. For a 32-element array, the ultrasound beam in the azimuth plane in water could be electronically focused in the 100 MHz range to obtain a half-amplitude width of 60 /spl mu/m at the focal depth, agreeing well with theoretical predictions. Besides the use demonstrated with this present transducer, piezoelectric thin films should also lead to fabrication of various other kinds of ultrasonic transducers that can operate at high frequencies and should provide opportunities for miniaturizing transducers and making integrated ultrasonic devices.<>
  • Keywords
    acoustic arrays; acoustic transducers; etching; photolithography; sputter deposition; ultrasonic imaging; ultrasonic materials testing; ultrasonic transducer arrays; zinc compounds; 10 micron; 100 MHz; V-shaped grooves; ZnO; ZnO thin films; anisotropic etchant; half-amplitude width; integrated ultrasonic devices; linear transducer; nondestructive testing; photolithography; rf-magnetron sputter deposition; ultrasonic transducer array; uniform ultrasonic response; Chromium; Etching; Gold; Piezoelectric films; Piezoelectric transducers; Sputtering; Transistors; Ultrasonic transducer arrays; Ultrasonic transducers; Zinc oxide;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/58.365245
  • Filename
    365245