• DocumentCode
    1247952
  • Title

    New transverse-domain formation mechanism in a quarter-micrometre-gate HEMT

  • Author

    Awano, Yuji

  • Author_Institution
    Fujitsu Labs. Ltd., Atsugi
  • Volume
    24
  • Issue
    21
  • fYear
    1988
  • fDate
    10/13/1988 12:00:00 AM
  • Firstpage
    1315
  • Lastpage
    1317
  • Abstract
    Studies a quarter-micrometre-gate HEMT by a two-dimensional Monte Carlo particle simulation to gain a deeper insight into the device operation. A new transverse-domain formation due to intervalley electron transfer is predicted. The effect of domain formation on device performance and current saturation characteristics is also discussed
  • Keywords
    Monte Carlo methods; high electron mobility transistors; semiconductor device models; current saturation characteristics; device operation; device performance; domain formation; intervalley electron transfer; quarter-micrometre-gate HEMT; transverse-domain formation mechanism; two-dimensional Monte Carlo particle simulation;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • Filename
    5894