• DocumentCode
    1248297
  • Title

    Resistive Switching Behavior of Partially Anodized Aluminum Thin Film at Elevated Temperatures

  • Author

    Zhu, Wei ; Chen, T.P. ; Yang, Ming ; Liu, Yang ; Fung, S.

  • Author_Institution
    School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore
  • Volume
    59
  • Issue
    9
  • fYear
    2012
  • Firstpage
    2363
  • Lastpage
    2367
  • Abstract
    Resistive switching behavior of partially anodized aluminum thin film has been investigated at temperatures of 25 ^{\\circ}\\hbox {C} –250 ^{\\circ}\\hbox {C} . Both the reset and set voltages decrease with increasing temperature, showing Arrhenius-like dependence with small activation energies. The pulse voltage experiment also suggests that the conductive filament breaking/reconnection is easier to occur at a higher temperature. Some possible mechanisms for the phenomena are discussed. On the other hand, at elevated temperatures without continuous electric field applied, while the high-resistance state exhibits no significant change with time, the low-resistance state (LRS) shows a continuous degradation, and there is a sudden failure. The LRS failure time shows Arrhenius dependence with an activation energy of \\sim 1.3 eV, suggesting that the LRS failure could be due to the migration of the excess Al atoms at high temperatures.
  • Keywords
    Plasma temperature; Resistance; Switches; Temperature dependence; Temperature measurement; Voltage measurement; Aluminum oxide; resistive random access memory; resistive switching;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2012.2205692
  • Filename
    6244862