DocumentCode
1248297
Title
Resistive Switching Behavior of Partially Anodized Aluminum Thin Film at Elevated Temperatures
Author
Zhu, Wei ; Chen, T.P. ; Yang, Ming ; Liu, Yang ; Fung, S.
Author_Institution
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore
Volume
59
Issue
9
fYear
2012
Firstpage
2363
Lastpage
2367
Abstract
Resistive switching behavior of partially anodized aluminum thin film has been investigated at temperatures of 25
–250
. Both the reset and set voltages decrease with increasing temperature, showing Arrhenius-like dependence with small activation energies. The pulse voltage experiment also suggests that the conductive filament breaking/reconnection is easier to occur at a higher temperature. Some possible mechanisms for the phenomena are discussed. On the other hand, at elevated temperatures without continuous electric field applied, while the high-resistance state exhibits no significant change with time, the low-resistance state (LRS) shows a continuous degradation, and there is a sudden failure. The LRS failure time shows Arrhenius dependence with an activation energy of
1.3 eV, suggesting that the LRS failure could be due to the migration of the excess Al atoms at high temperatures.
Keywords
Plasma temperature; Resistance; Switches; Temperature dependence; Temperature measurement; Voltage measurement; Aluminum oxide; resistive random access memory; resistive switching;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2012.2205692
Filename
6244862
Link To Document