• DocumentCode
    1252275
  • Title

    Effect of silicon window polarity on partial-SOI LDMOSFETs

  • Author

    Yue Hu ; Gaofeng Wang ; Sheng Chang ; Hao Wang ; Qijun Huang

  • Author_Institution
    Sch. of Phys. Sci. & Technol., Wuhan Univ., Wuhan, China
  • Volume
    7
  • Issue
    7
  • fYear
    2012
  • fDate
    7/1/2012 12:00:00 AM
  • Firstpage
    628
  • Lastpage
    630
  • Abstract
    The effect of silicon window polarity on partial-silicon-on-insulator (PSOI) lateral double-diffused MOSFETs (LDMOSFETs) under high-voltage operation is studied. Different polarities of the silicon window in PSOI LDMOSFETs are analysed to investigate their effects on electrical characteristics: breakdown voltage (BV) and on-resistance (Ron). In PSOI LDMOSFETs, the P-type silicon window is considered as a part of the substrate, whereas the N-type silicon window falls into the drift region, which affects the high-voltage operation of devices. The two-dimensional simulation results show that the BV of PSOI LDMOSFET with P-type window is higher than that of PSOI LDMOSFET with N-type window, whereas the Ron of PSOI LDMOSFET with P-type window is lower than that of PSOI LDMOSFET with N-type window.
  • Keywords
    MOSFET; electric resistance; elemental semiconductors; high-voltage techniques; semiconductor device breakdown; silicon; silicon-on-insulator; Si; breakdown voltage; electrical characteristics; high-voltage operation; n-type silicon window polarity; on-resistance characteristic; partial-silicon-on-insulator lateral double-diffused MOSFETs;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2012.0351
  • Filename
    6250094