• DocumentCode
    1253495
  • Title

    Twenty-five years of progress in vacuum arc research and utilization

  • Author

    Boxman, Raymond L. ; Goldsmith, Samuel ; Greenwood, A.

  • Author_Institution
    Electr. Discharge & Plasma Lab., Tel Aviv Univ., Israel
  • Volume
    25
  • Issue
    6
  • fYear
    1997
  • fDate
    12/1/1997 12:00:00 AM
  • Firstpage
    1174
  • Lastpage
    1186
  • Abstract
    Progress in understanding and applying vacuum arcs is reviewed. Laser diagnostics have demonstrated the existence of micron-sized regions in the cathode spot plasma having electron densities exceeding 1026 m-3. The expanding plasma produces a highly ionized jet whose ions typically have charge states of 1-3 and energies of 50-150 eV. Gas dynamic and explosive emission models have been formulated to explain cathode spot operation. In cases where the arc is constricted at the anode, forming an anode spot, or the anode is thermally isolated, forming a hot anode vacuum arc, material emitted from the anode may dominate the interelectrode plasma. Evaporation from liquid droplets may also provide a substantial component of the plasma, and the presence of these droplets can have deleterious consequences in applications. The vacuum arc has been extensively utilized as a plasma source, particularly for the deposition of protective coatings and thin films, and as a switching medium in electrical distribution circuit breakers
  • Keywords
    circuit-breaking arcs; electron density; plasma applications; plasma density; plasma deposition; plasma production; reviews; vacuum arcs; 50 to 150 eV; applications; cathode spot operation; cathode spot plasma; charge states; electrical distribution circuit breakers; electron density; explosive emission models; gas dynamic models; highly ionized jet; interelectrode plasma; laser diagnostics; liquid droplets evaporation; micron-sized regions; protective coatings deposition; review; switching medium; thermally isolated anode; thin films; vacuum arc research; Anodes; Cathodes; Electrons; Explosives; Plasma applications; Plasma density; Plasma diagnostics; Plasma materials processing; Plasma sources; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.650894
  • Filename
    650894