• DocumentCode
    1257867
  • Title

    Semianalytical description of nonlocal secondary electrons in a radio frequency capacitively coupled plasma at intermediate pressures

  • Author

    Berezhnoi, Stanislav V. ; Kaganovich, Igor D. ; Misina, Martin ; Bogaerts, Annemie ; Gijbels, Renaat

  • Author_Institution
    Dept. of Phys. Tech., St. Petersburg State Tech. Univ., Russia
  • Volume
    27
  • Issue
    5
  • fYear
    1999
  • fDate
    10/1/1999 12:00:00 AM
  • Firstpage
    1339
  • Lastpage
    1347
  • Abstract
    A model for fast simulation of a radio-frequency capacitively coupled discharge in the pressure range of a few torr and higher has been developed. The semi-analytical description of the nonlocal ionization by secondary (γ) electrons allows us to evaluate the discharge parameters in detail even when the local approach for γ electrons is not valid. We focused on the effect of steep increase of the plasma density at the central part of the discharge, at the transition from α to γ regime. The present study demonstrates that in the γ regime the plasma density at the discharge center is proportional to the spatial scale of ionization decay by γ electrons inside the plasma region. We have investigated the electron energy distribution function of γ electrons both analytically and numerically. As a result, the analytical formulas for the spatial scales of ionization decay by γ electrons were found in limiting cases
  • Keywords
    high-frequency discharges; ionisation; plasma density; plasma diagnostics; plasma pressure; α regime; α to γ regime transition; γ electrons; γ regime; analytical formulas; discharge parameters; electron energy distribution function; fast simulation; intermediate pressures; ionization decay; limiting cases; nonlocal ionization; nonlocal secondary electrons; plasma density; plasma diagnostics; plasma pressure; plasma simulation; radio frequency capacitively coupled plasma; semianalytical description; spatial scales; Electrons; Ionization; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma sheaths; Plasma simulation; Radio frequency; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.799810
  • Filename
    799810