Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process

Author

Yagami, Kojiro ; Tsunoda, Masakiyo ; Sugano, S. ; Takahashi, Migaku

Author_Institution

Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan

Volume

35

Issue

5

fYear

1999

fDate

9/1/1999 12:00:00 AM

Firstpage

3919

Lastpage

3921

Abstract

An effect of the Ir content and sputtering conditions of Mn-Ir films on the strength of exchange anisotropy was investigated in Ni-Fe/Mn-Ir layers fabricated under the extremely clean sputtering process. We found that the unidirectional anisotropy constant J_k monotonously increased with increasing the Ir content and decreasing the deposition rate of Mn-Ir films. The change of J_k against the deposition rate of Mn-Ir films is possibly caused by the quite slight changes of the microstructure of Mn-Ir films, which were undetectable with XRD

Keywords

crystal microstructure; exchange interactions (electron); ferromagnetic materials; iridium alloys; iron alloys; magnetic anisotropy; magnetic multilayers; manganese alloys; nickel alloys; sputter deposition; Ir content; Ni-Fe/Mn-Ir films; NiFe-MnIr; deposition rate; exchange anisotropy; extremely clean sputtering process; microstructure; sputtering conditions; unidirectional anisotropy; Anisotropic magnetoresistance; Chaos; Digital audio players; Iron; Magnetic anisotropy; Magnetic films; Microstructure; Sputtering; Temperature; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.800708

Filename

800708