DocumentCode
1261359
Title
Tribological characteristics of SiNx films
Author
Wen, Jianming ; Ying, Xiao ; Wong, King ; Barth, Gunter ; Chen, GaLane
Author_Institution
Quinta Corp., San Jose, CA, USA
Volume
35
Issue
5
fYear
1999
fDate
9/1/1999 12:00:00 AM
Firstpage
2358
Lastpage
2360
Abstract
The tribological performance and chemical compositions of thick (75 nm-120 nm) amorphous SiNx films are studied with CSS testers and XPS. A high-speed H/D contact program is used to provide intermittent head/disc contacts. Films with high Si/N ratio (1.25) and high oxygen concentration (22%) have the best durability. Films´ durability is also affected by the sputtering conditions used to prepare films. A higher N2/Ar ratio will produce a lower durability film. The film durability is not sensitive to the total pressure and sputtering power in the range of 5-15 mTorr and 1-4 kWatt
Keywords
X-ray photoelectron spectra; amorphous state; dielectric thin films; magnetic heads; magneto-optical recording; protective coatings; silicon compounds; sputtered coatings; wear; wear testing; 75 to 120 nm; N2/Ar ratio; SiN; XPS; amorphous SiNx films; chemical composition; contact-start-stop testers; durability; head-disc contact; oxygen concentration; sputtering conditions; tribological performance; Amorphous materials; Cascading style sheets; High speed optical techniques; Magnetic heads; Optical films; Optical microscopy; Optical recording; Optical sensors; Sputtering; Testing;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.800824
Filename
800824
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