• DocumentCode
    1267053
  • Title

    Intentional Distortion of Transistor Shape to Improve Circuit Performance

  • Author

    Moroz, Victor ; Choi, Munkang ; Lin, Xi-Wei

  • Author_Institution
    Synopsys, Inc., Mountain View, CA, USA
  • Volume
    31
  • Issue
    1
  • fYear
    2010
  • Firstpage
    62
  • Lastpage
    64
  • Abstract
    A mixed-mode 3-D simulation study has been performed for ring oscillators made of 30-nm planar CMOS transistors with nonrectangular channel shapes. Nonrectangular shapes happen unintentionally due to optical proximity effects and can also be introduced intentionally. Transistors with large drains are shown to degrade ring-oscillator performance, whereas transistors with large sources are shown to simultaneously increase the ring-oscillator frequency by 25% and reduce the leakage current by a factor of three.
  • Keywords
    CMOS integrated circuits; leakage currents; oscillators; proximity effect (lithography); transistors; CMOS transistors; circuit performance; intentional distortion; leakage current; mixed-mode 3D simulation study; nonrectangular channel shapes; optical proximity effects; ring oscillators; transistor shape; 3-D simulation; Layout optimization; nonrectangular transistor; ring-oscillator benchmarking;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2034758
  • Filename
    5313895