• DocumentCode
    1269704
  • Title

    Waveguided Ge/Si Avalanche Photodiode With Separate Vertical SEG-Ge Absorption, Lateral Si Charge, and Multiplication Configuration

  • Author

    Zhu, Shiyang ; Ang, Kah-Wee ; Rustagi, Subhash C. ; Wang, J. ; Xiong, Y.Z. ; Lo, G.Q. ; Kwong, D.L.

  • Author_Institution
    Inst. of Microelectron., Agency for Sci., Technol. & Res., Singapore, Singapore
  • Volume
    30
  • Issue
    9
  • fYear
    2009
  • Firstpage
    934
  • Lastpage
    936
  • Abstract
    A novel Si-waveguide-integrated Ge/Si avalanche photodiode (APD) is demonstrated for the first time, in which light propagating along the Si waveguide is evanescently absorbed by an overlaying Ge layer selectively grown on it, whereas the avalanche multiplication of photoexcited carriers occurs laterally in the Si-waveguide layer. The APD provides a responsivity of ~7.2 A/W at 1550 nm, which is ~26 times larger than the corresponding vertical Ge/Si p-i-n photodiode, and exhibits a 3-dB bandwidth of ~3.3 GHz, a dark current of ~22 ??A at 22-V bias, and an excess noise factor of ~4, respectively.
  • Keywords
    Ge-Si alloys; avalanche photodiodes; elemental semiconductors; light propagation; photoexcitation; Ge; Si; evanescent coupling; germanium heteroepitaxy; multiplication configuration; photoexcited carriers; vertical absorption; waveguided avalanche photodiode; Avalanche photodiode (APD); Si photonics; Si waveguide; evanescent coupling; germanium heteroepitaxy;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2025782
  • Filename
    5184883