• DocumentCode
    1273776
  • Title

    Direct Metal Transfer Lithography for Fabricating Wire-Grid Polarizer on Flexible Plastic Substrate

  • Author

    Chen, Chun-Hung ; Yu, Te-Hui ; Lee, Yung-Chun

  • Author_Institution
    Dept. of Mech. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
  • Volume
    20
  • Issue
    4
  • fYear
    2011
  • Firstpage
    916
  • Lastpage
    921
  • Abstract
    This paper reports on the fabrication of polymer-based metallic wire-grid polarizers using a direct metal contact printing method. The proposed method can directly transfer a metal pattern from a silicon mold to a soft plastic substrate simply by roller pressing and infrared (IR) heating. With properly chosen loading contact pressure and heating temperature, metallic linear grating structures with a linewidth of 60 nm, a period of 170 nm, and an area size of 2.5 ×2.5 cm2 are successfully formed on the surface of a polyethylene terephtalate (PET) substrate. The optical performance of the fabricated flexible polarizers is experimentally measured and numerically analyzed in the near-IR spectrum with wavelength from 800 to 1500 nm. Inspired by the numerical simulation results, the optical characteristics of the flexibe polarizers are further enhanced by reactive ion etching on the PET substrate. Good agreements between experiments and theoretical simulation are obtained. Future developments and potential applications of this metal contact transfer lithography method will be addressed.
  • Keywords
    flexible structures; nanolithography; numerical analysis; polymers; printing; sputter etching; IR heating; PET substrate; contact pressure; direct metal contact printing method; direct metal transfer lithography; flexible plastic substrate; heating temperature; infrared heating; metal contact transfer lithography method; metal pattern; metallic linear grating structures; near-IR spectrum; numerical simulation; optical characteristics; polyethylene terephtalate substrate; polymer-based metallic wire-grid polarizer fabrication; reactive ion etching; roller pressing; silicon mold; soft plastic substrate; wavelength 800 nm to 1500 nm; Gratings; Lithography; Metals; Optical variables measurement; Polymers; Positron emission tomography; Substrates; Direct metal contact printing method; infrared (IR); metallic wire-grid polarizers; numerical simulation;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2011.2160046
  • Filename
    5955061