DocumentCode
1277102
Title
Electron Density Oscillations in CC-RF Oxygen Plasma Investigated by Gaussian Beam Microwave Interferometry
Author
Küllig, Christian ; Dittmann, Kristian ; Meichsner, Jürgen
Author_Institution
Inst. of Phys., Univ. of Greifswald, Greifswald, Germany
Volume
39
Issue
11
fYear
2011
Firstpage
2564
Lastpage
2565
Abstract
Gaussian beam microwave interferometry (160 GHz, beam waist of 5 mm) is applied to study the electron density in capacitively coupled radio-frequency (RF) oxygen plasma. The microwave interferometry provides immediately the line-integrated electron density without model assumptions. In the considered range of RF power and total pressure, the investigations have shown that the oxygen plasma is dominated by electron density oscillations due to the attachment-induced ionization instability. The frequency of the mostly nonharmonic oscillations ranges between 0.3 and 3 kHz with peak-to-peak line-integrated electron density variations up to 3.5 × 1015 m-2.
Keywords
Gaussian distribution; electron density; high-frequency discharges; interferometry; ionisation; plasma density; plasma instability; plasma oscillations; CC-RF oxygen plasma; Gaussian beam microwave interferometry; attachment-induced ionization instability; capacitively coupled radio-frequency oxygen plasma; electron density oscillations; frequency 160 GHz; line-integrated electron density; microwave interferometry; nonharmonic oscillations; peak-to-peak line-integrated electron density; Discharges; Microwave oscillators; Microwave theory and techniques; Particle beams; Plasmas; Radio frequency; Electrons; interferometry; plasma diagnostics; plasma stability;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2011.2156430
Filename
5958623
Link To Document