• DocumentCode
    1283566
  • Title

    Radio-Frequency Transistors Using Chemical-Vapor-Deposited Monolayer Graphene: Performance, Doping, and Transport Effects

  • Author

    Nayfeh, Osama M.

  • Author_Institution
    Sensors & Electron Devices Directorate, U.S. Army Res. Lab., Adelphi, MD, USA
  • Volume
    58
  • Issue
    9
  • fYear
    2011
  • Firstpage
    2847
  • Lastpage
    2853
  • Abstract
    Large-area graphene is synthesized by Cu-catalyzed chemical vapor deposition (CVD), transistors are constructed, and the dc/RF performance is examined. Top-gate transistors, i.e., with a gate length of 3 μm and Vds = 5 V, have a peak dc transconductance in excess of 20 mS/mm and a drive current of 0.5 A/mm. RF measurements achieve gigahertz extrinsic current-gain cutoff frequency with low back biasing. Back-gated devices are used to examine doping and transport effects that impact the performance. Good agreement between measurements and a drift-diffusion model is obtained for gapless graphene with a net p-type doping and asymmetric electron/hole mobility. The mean free path for scattering is extracted and reveals that the transport suffers from large levels of Coulomb scattering and short-range scattering. The results are of importance for understanding the performance potential of large-area CVD graphene in future RF devices.
  • Keywords
    chemical vapour deposition; electron mobility; graphene; semiconductor doping; transistors; CVD; Coulomb scattering; asymmetric electron mobility; back-gated device; chemical-vapor-deposition; drift-diffusion model; large-area graphene; monolayer graphene; net p-type doping; radio-frequency transistor; short-range scattering; size 3 micron; top-gate transistor; transport effect; voltage 5 V; Charge carrier processes; Doping; Logic gates; Radio frequency; Scattering; Semiconductor process modeling; Transistors; Ambipolar; chemical vapor deposition (CVD); doping; graphene; mobility; radio frequency (RF); transistor;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2159721
  • Filename
    5962355